Electron Source for Near Ambient Pressure
Highly reliable electron sources, originally built to operate in UHV systems in deposition / growth chambers (such as MBE, PLD), were redesigned to operate at much higher vacuum pressure while keeping excellent beam properties. Using multiple pumping stages and optimizing the electron optic system, the sources adapt well to the higher pressure conditions.
The NAP electron sources available span a wide range of beam energies. Higher energy is used for higher operating pressures. High energy sources can be equipped with a foil window to raise the operating pressure to near atmosphere.
A short working distance is required for operation above 10 Torr to reduce the beam scattering effects.
These sources are compatible with XRS (XRF) and possibly RHEED.
All sources can deliver electron beams of much lower energy if the environmental pressure is lowered. Energies below 1 keV can easily
be reached by the nap-ES10 and nap-ES30 sources when running at lower chamber pressure.
The NAP sources are microprocessor controlled to simplify operation.
In addition they can be controlled from a PC able to monitor, save, and retrieve all major parameters.
Standard Applications
Besides being used for material processing (decomposition, cracking, desorption), the NAP electron sources are used for spectroscopy applications as shown below.
| MODEL | AES Auger Electron Spectroscopy |
REELS Electron Energy Loss Spectroscopy |
RHEED Reflection High Electron Energy Diffraction |
XRS X-Ray Spectroscopy |
| nap-ES10 10 kV |
Y | Y | Y | |
| nap-ES30 30 kV |
Y | Y | Y | |
| nap- ES50 50 kV |
Y | Y | Y | |
| nap-ES100 100 kV |
Y | Y | Y |
Electron Sources Available for UHV to NAP
| Model | nap-ES10 | nap-ES30 | nap-ES50 | nap-ES100 |
| Max. energy (keV) | 10 | 30 | 50 | 100 |
| Max. pressure (N2) | 1 Torr | 10 Torr | 30 Torr | 60 Torr |
| Foil window option | – | – | >0.1 atm | >0.1 atm |
All information is subject to modification at any time and is not part of the technical specifications.
Differential Pumping Options
All electron sources are available with single (DP1), double (DP2) or triple (DP3) differential pumping capabilities in cases where the operating pressure is less than indicated in the above table.
Picture of NAP-Electron Source
