Reflection High Energy Electron Diffraction (RHEED) at Near Ambient Pressure

The high energy of the electron beam used for RHEED is of great advantage for operating at higher vacuum pressure.  RHEED can be operated in the energy range 10 to 100 keV using a nap-ES electron source.  The detector is a high spacial resolution fluorescent screen coupled to a high sensitivity CCD camera.  The detector unit can be differentially pumped for operation in the highest vacuum pressure range.

RHEED systems

Model nap-RHEED-30 nap-RHEED-50 nap-RHEED-100
Max. beam energy (keV) 30 50 100
Max. pressure (N2) >10 Torr >20 Torr >50 Torr
Foil window >100 Torr >300 Torr

All information is subject to modification at any time and is not part of the technical specifications.

The length travelled by electrons must be short enough to keep electron scattering low in order to ensure good diffraction patterns. The distances between sample and source/detector are in the range of 5-25 mm at high pressure.

NAP-Process Chamber
NAP-Diffraction Chamber