Ion Source for Near Ambient Pressure
The pristine option for NAP applications is to use a Duoplasmatron Ion Source because the source itself operates at very high vacuum pressure, thus avoiding cross-contamination due to the back flow of gas from the chamber into the source plasma. Duoplasmatron also delivers highest beam brightness and can be focused into a small spot size of high current density as required for depth profiling and etching. Duoplasmatron Ion Sources are available for a wide range of energies from less than 1 keV up to 100 keV. All sources can operate from UHV to NAP with suitable pumping.
WSI offers a high beam current Duoplasmatron Sources able to operate with various inert (He, N2, Ar) or reactive gases ( H2,O2).
| Model | nap-DIS5 | nap-DIS10 | nap-DIS30 | nap-DIS50 | nap-DIS100 |
| Max. energy (keV) | 5 | 10 | 30 | 50 | 100 |
| Max. pressure (N2) | >100 mTorr | >100 mTorr | >300 mTorr | >1 Torr | >10 Torr |
All information is subject to modification at any time and is not part of the technical specifications.
Differential Pumping Options
The ion source is available with single (DP1), double (DP2) or triple (DP3) pumping capabilities in cases where the operating pressure is less than indicated in the above table.
Picture of NAP-Ion Source